Photoreflectance investigations of HEMT structures grown by MBE

High electron mobility transistor (HEMT) structures consisting of: GaAs (buffer layer)/i-AlGaAs(spacer layer)/n-AlGaAs(barrier layer)/n-GaAs(cap layer) were grown by MBE on GaAs substrates. The optical properties of the HEMT structures were studied by photoreflectance (PR) spectroscopy at different temperatures. We observed in the PR spectra transitions located approximately at 1.41 and 1.85 eV, associated with the energy band edges of GaAs and AlGaAs, respectively. Oscillatory signals slightly above these energies were recognized as Franz-Keldysh oscillations (FKO). By employing lasers with different wavelengths as modulation sources, and by varying the thickness of the layers in the heterostructures we were able to identify the origin of the PR signals in the spectra. The FKO close to the GaAs band gap originate at the GaAs buffer/i-AlGaAs heterojunction where the two-dimensional electron gas is localized. Finally, low-temperature PR experiments indicate that the oscillatory signal observed above the AlGaAs band edge is formed by two overlapped signals, one of which originates in the GaAs(cap)/n-AlGaAs interface. © 2005 Elsevier B.V. All rights reserved.

A1. Interfaces; A1. Low-dimensional structures; A3. Molecular beam epitaxy; B2. Semiconducting III-V materials; B3. High electron mobility transistor Characterization; Interfaces (materials); Modulation; Molecular beam epitaxy; Nanostructured materials; Oscillations; Reflection; Semiconductor materials; Interfaces; Low-dimensional structures; Semicondcuting III-V materials; Spectra transition; High electron mobility transistors

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