Optical and electrical properties of Si-doped GaAs films grown on (631)-oriented substrates
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This work studies the Si-doping of GaAs on (631)-oriented substrates as a function of the As4-beam equivalent pressure (PAs). The electrical properties obtained by Hall effect measurements show that the mobility of the layers grown on (631)-substrates present changes related to carrier compensation processes and the Si-doping changes from p- to n-type when PAs is increased. The optical properties of the samples, as observed by photoluminescence (PL) spectroscopy, modified according to the electrical characteristics. For (631)-samples, when PAs is increased the energy of the maximum intensity PL peak redshifts in the p-type region but, after the threshold of the conduction type conversion, the peak blueshifts in the n-type region. The variation of the PL excitation intensity also shifts the emission energy of the samples as a consequence of the increasing recombination rate for close pairs in donor acceptor pair recombination. Photoluminescence as a function of temperature shows that the activation energy of the PL lines transition is enhanced as PAs is increased. © 2012 American Vacuum Society.
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Activation energy; Gallium arsenide; Optical properties; Photoluminescence spectroscopy; Semiconducting gallium; Semiconductor doping; Silicon; Beam equivalent pressure; Blueshifts; Carrier compensation; Conduction type; Donor-acceptor-pair recombination; Electrical characteristic; Emission energies; GaAs; GaAs films; Hall effect measurement; Maximum intensities; Optical and electrical properties; P-type; PL excitations; Recombination rate; Red shift; Si-doping; Work study; Electric properties
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