Synthesis of GaAs quantum dots on Si-layers on AlGaAs films grown on GaAs(100)
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In this work we report a novel method for obtaining GaAs quantum dots (QDs) by molecular beam epitaxy (MBE) on an AlGaAs underlying film. We propose to use a Si monolayer (ML) grown on AlGaAs in order to induce a three-dimensional nucleation during the GaAs overgrowth. We observe that when 2.1 MLs of GaAs are grown on 1 ML of Si, the GaAs is self-assembled in islands. Islands of 15-Å height and a lateral size of 200 Å were clearly observed. 77 K photoluminescence and photoreflectance spectra of capped GaAs dots showed an additional signal at ∼ 1.88 eV, presumably related to the islands emission, thereby verifying an efficient quantum confinement. © 2003 Elsevier Science B.V. All rights reserved.
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GaAs/Si; Molecular beam epitaxy; Quantum dots; Semiconducting III-V materials Film growth; Molecular beam epitaxy; Monolayers; Nucleation; Photoluminescence; Semiconducting aluminum compounds; Semiconducting gallium arsenide; Silicon; Thin films; Quantum confinement; Semiconductor quantum dots
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