An interface clusters mixture model for the structure of amorphous silicon monoxide (SiO)
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The present state of research on the structure of amorphous silicon monoxide (SiO) is reviewed. The black, coal-like modification of bulk SiO is studied by a combination of diffraction, microscopy, spectroscopy, and magnetometry methods. Partial radial distribution functions of SiO are obtained by X-ray, neutron and electron diffraction. Disproportionation of SiO into Si and SiO2 is verified. High resolution TEM gives an upper limit of less than 2 nm for the typical Si cluster size. The SiK-edge electron energy-loss near-edge structure (ELNES) data of SiO are interpreted in terms of the oxidation states Si4%2b and Si0. X-ray photoelectron spectroscopy gives first details about possible stoichiometric inhomogeneities related to internal interfaces. The wipe-out effect in the 29Si MAS NMR signal of SiO is confirmed experimentally. The new estimation of the wipe-out radius is about 1.1 nm. First-time W-band, Q-band, and X-band ESR and SQUID measurements indicate an interfacial defect structure. Frequency distributions of atomic nearest-neighbours are derived. The interface clusters mixture model (ICM model) suggested here describes the SiO structure as a disproportionation in the initial state. The model implies clusters of silicon dioxide and clusters of silicon surrounded by a sub-oxide matrix that is comparable to the well-known thin Si/SiO2 interface and significant in the volume because of small cluster sizes. © 2003 Published by Elsevier Science B.V.
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Amorphous silicon; Chemical modification; Electron diffraction; Electron energy loss spectroscopy; Electron spin resonance spectroscopy; Interfaces (materials); Molecular structure; Neutron diffraction; Nuclear magnetic resonance spectroscopy; SQUIDs; Transmission electron microscopy; X ray diffraction analysis; Interface clusters; Silica
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