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Consejo Nacional de Ciencia y Tecnología, CONACYT: CB 237099, FAI 2018 SUO 808
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funding vehicle for: Effects of Mg incorporation in cubic GaN films grown by PAMBE near Ga rich conditions

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RDF description of Effects of Mg incorporation in cubic GaN films grown by PAMBE near Ga rich conditions - http://orbis.uaslp.mx/vivo/individual/scopus6136
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date: 2026-08-24T03:51:27
publisher: vivo
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Article
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Effects of Mg incorporation in cubic GaN films grown by PAMBE near Ga rich conditions
page end: 200
related by: authorship_39399
type: Document
related by: authorship_39398
origen: scopus
type: Information Content Entity
related by: authorship_39394
doi: 10.1016/j.mssp.2018.12.019
date time value: article date 6137
has publication venue: Materials Science in Semiconductor Processing
related by: authorship_39397
most specific type: Article
related by: authorship_39396
type: Generically Dependent Continuant
has funding vehicle: Consejo Nacional de Ciencia y Tecnología, CONACYT: CB 237099, FAI 2018 SUO 808
e iscopus: 2-s2.0-85059767350
abstract: The structural and electrical properties of Mg-doped cubic GaN epi-layers grown by plasma-assisted molecular beam epitaxy (PAMBE) near Ga rich conditions are investigated. The diffraction of high-energy reflected electrons (RHEED) in situ, in addition to structural studies of X-ray diffraction, show that the fraction of hexagonal and crystal twinning inclusions decreases when the Mg flux increases. The condition for the higher incorporation of Mg where the electrical properties are optimized is highly sensitive to the flow ratio Mg/Ga. The p-doping level steadily increases with increasing Mg flux. The Mg concentration obtained by secondary ion mass spectroscopy (SIMS) from samples grown at Mg temperatures from 200 °C to 700 °C are in a range between 2 × 10 19 to 2 × 10 20 atoms/cm 3 . The highest mobility and p-type doping level achieved, determined from Hall measurements, were 28.2 cm 2 /V-s and 2 × 10 19 cm −3 , respectively. We corroborate that the Mg doped c-GaN films are suitable for the construction of optoelectronic devices based on cubic III-Nitrides. © 2018
estado: published
type: Continuant
page start: 196
volume: 93
type: Entity
crisid: 6137
freetext keyword: Cubic GaN diode; Mg p-type doping; Plasma-assisted molecular beam epitaxy Gallium; Gallium nitride; Hall mobility; III-V semiconductors; Molecular beam epitaxy; Molecular beams; Optoelectronic devices; Secondary ion mass spectrometry; Semiconductor doping; Twinning; Cubic III-nitrides; Ga-rich conditions; Mg concentrations; P-type doping; Plasma assisted molecular beam epitaxy; Secondary ion mass spectroscopies (SIMS); Structural and electrical properties; Structural studies; Magnesium
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related by: authorship_39393
type: Article
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related by: authorship_39395
related by: authorship_39392
related by: authorship_39400

Materials Science in Semiconductor Processing
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publication venue for: Effects of Mg incorporation in cubic GaN films grown by PAMBE near Ga rich conditions