Thickness and photocatalytic activity relation in TiO2:N films grown by atomic layer deposition with methylene-blue and E. coli bacteria
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This study presents an analysis of the photocatalytic efficiency in TiO2:N thin films grown by atomic layer deposition related to the film thickness. The nitriding process was carried out with nitrogen plasma by molecular nitrogen decomposition after TiO2 deposition. The study was performed using the time-dependent degradation of colour units for methylene-blue solutions and inactivation percentages for Escherichia coli bacteria, for potential applications in sewage purification. To determine the optoelectronic properties of the films, the optical, structural, surface and thickness characterizations were carried out by photoluminescence, Raman spectroscopy, atomic force microscopy and scanning electron microscopy, respectively. © Indian Academy of Sciences.
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Anatase phase; Atomic layer deposition; Degradation; Inactivation; Photocatalytic; Photoluminescence Aromatic compounds; Atomic force microscopy; Atomic layer deposition; Bacteria; Biodegradation; Complexation; Degradation; Escherichia coli; Nitriding; Nitrogen; Nitrogen plasma; Photoluminescence; Plasma applications; Scanning electron microscopy; Sewage; Thin films; Anatase phase; Escherichia coli bacteria; Inactivation; Methylene blue solution; Optoelectronic properties; Photo-catalytic; Photocatalytic activities; Photocatalytic efficiency; Deposition
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