High-speed deposition of oriented orthorhombic NaTaO3 films using laser chemical vapor deposition
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Overview
abstract
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We demonstrated the high-speed laser chemical vapor deposition of orthorhombic NaTaO3 (o-NaTaO3) films. The orientation of the o-NaTaO3 films was changed from (101) to (112) to (001) plane as the increase of deposition temperature from 823 to 913 K. o-NaTaO3 films had faceted surfaces and columnar cross sections. The deposition rates of o-NaTaO3 films were 48–120 µm h−1, which are 192–6000 times higher than those offered by wet-chemical routes. © 2016 Elsevier B.V.
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Consejo Nacional de Ciencia y Tecnología, CONACYT: PDCPN2014-01-248692, CB-2014-237049, INFRA-2015–252753 Grant
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Fondo de Innovación para la Competitividad, FIC: 253090, 290936 Grant
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Japan Society for the Promotion of Science, KAKEN: 16H04211, 25709069, 15K14176 Grant
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Secretaría de Educación Pública, SEP: PROFOCIE-2014–19-MSU0011T-1 Grant
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Universidad Autónoma de Nuevo León, UANL Grant
Research
keywords
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Laser chemical vapor deposition; Oriented growth; Orthorhombic NaTaO3 Chemical vapor deposition; Deposition; Deposition rates; Deposition temperatures; Faceted surfaces; High speed deposition; High speed laser; Laser chemical vapor deposition; Oriented growth; Orthorhombic NaTaO3; Wet chemical route; Vapor deposition
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