On the origin of light emission in silicon rich oxide obtained by low-pressure chemical vapor deposition
Article
-
- Overview
-
- Research
-
- Identity
-
- Additional Document Info
-
- View All
-
Overview
abstract
-
Silicon Rich Oxide (SRO) has been considered as a material to overcome the drawbacks of silicon to achieve optical functions. Various techniques can be used to produce it, including Low-Pressure Chemical Vapor Deposition (LPCVD). In this paper, a brief description of the studies carried out and discussions of the results obtained on electro-, cathode-, and photoluminescence properties of SRO prepared by LPCVD and annealed at 1,100 C are presented. The experimental results lead us to accept that SRO emission properties are due to oxidation state nanoagglomerates rather than to nanocrystals. The emission mechanism is similar to Donor-Acceptor decay in semiconductors, and a wide emission spectrum, from 450 to 850nm, has been observed. The results show that emission is a function of both silicon excess in the film and excitation energy. As a result different color emissions can be obtained by selecting the suitable excitation energy. Copyright © 2012 M. Aceves-Mijares et al.
publication date
Research
keywords
-
Color emission; Donor-acceptors; Emission mechanism; Emission properties; Emission spectrums; Nano-agglomerates; Optical function; Oxidation state; Photoluminescence properties; Silicon rich oxides; Chemical vapor deposition; Emission spectroscopy; Excitation energy; Vapors
Identity
Digital Object Identifier (DOI)
Additional Document Info
start page
end page
volume