Hybrid micro and nanostructured silicon surfaces fabricated by laser ablation and electrochemistry

This work reports on laser-processed silicon surfaces%27 morphological and wetting characteristics. The silicon surfaces were initially exposed to pulsed laser radiation in the femtosecond regime. The laser emitted in its fundamental wavelength (λ = 1030 nm), and the processing was carried out in air at atmospheric pressure. The surfaces were then subjected to electrochemical modification to create micro and nano porosity. The experimental conditions allowed the creation of various hybrid systems based on laser radiation and subsequent electrochemical treatment (using HF-DMSO). This procedure altered the surface wetting behavior from hydrophilic to hydrophobic due to the distinct surface morphology without needing a specific coating.

Electrochemical; Hybrid surfaces; Laser processing; Porous silicon; Wettability Femtosecond lasers; Laser chemistry; Laser materials processing; Porous silicon; Silicon wafers; Wetting; Electrochemicals; Exposed to; Hybrid surface; Laser electrochemistry; Laser process; Lasers ablations; Morphological characteristic; Nanostructured silicon; Silicon surfaces; Wetting characteristics; Laser ablation

VIVO