abstract

• Patterned arrays of nickel microstructures were fabricated by electron beam lithography and DC sputtering on the surface of Si (001) substrates. Influence of the micro-arrays on the Si substrate surface was evaluated using polarized micro-Raman spectroscopy. Raman spectra maps were taken in two configurations z(xx)z and z(yy)z for arrays of 18.5 μm × 15.5 μm. The Si longitudinal optical (LO) phonon shifted to lower vibrational frequencies by 5 cm-1 in regions near to the vicinities of the Ni micro structures. From the deformation elastic theory, it is found that this frequency shift is explained by an in-plane tensile stress induced by the Ni micro arrays producing a strain of 1.4%25. © 2017 Author(s).

authors

• González Contreras Francisco Javier
• Méndez-Lozoya J.
• Rodríguez Vázquez Ángel Gabriel
• Rodríguez-Aranda F.J.

publication date

• 2017-01-01

funding provided via

• Consejo Nacional de Ciencia y Tecnología, CONACYT: 237099, CEMIE-Sol 32  Grant

published in

• Journal of Applied Physics  Journal

keywords

• Electron beam lithography; Lithography; Microstructure; Nickel; Raman spectroscopy; Substrates; DC sputtering; Elastic theory; Frequency shift; Longitudinal optical phonons; Patterned arrays; Polarized micro-Raman; Si (001) substrate; Si(001) surfaces; Silicon

Digital Object Identifier (DOI)

• 10.1063/1.4985817

start page

end page

volume

• 122

issue

• 12